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Proceedings Paper

The first full-field EUV masks ready for printing
Author(s): Uwe Mickan; Rogier Groeneveld; Marcel Demarteau; Jan Hendrik Peters; Uwe Dersch; Günter Hess; Holger Seitz
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Paper Abstract

ASML's first EUV alpha demo tool (ADT) is ready for lithographic set up, driving the need for qualified and fully compliant EUV masks. EUV reflection masks are different in blank and mask processes compared to current technologies e.g. masks for 193nm. Although in recent years individual EUV mask parameters have been demonstrated, it is only with the fabrication on the ADT mask set that fully compliant masks have been made. In this paper we discuss the typical requirements of a EUV full-field mask, and show first results from achieving the important milestone of fabricating EUV masks.

Paper Details

Date Published: 21 June 2006
PDF: 10 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 628105 (21 June 2006); doi: 10.1117/12.692629
Show Author Affiliations
Uwe Mickan, ASML Netherlands B.V. (Netherlands)
Rogier Groeneveld, ASML Netherlands B.V. (Netherlands)
Marcel Demarteau, ASML Netherlands B.V. (Netherlands)
Jan Hendrik Peters, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
Uwe Dersch, Advanced Mask Technology Ctr. GmbH & Co. KG (Germany)
Günter Hess, SCHOTT Lithotec AG (Germany)
Holger Seitz, SCHOTT Lithotec AG (Germany)

Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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