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Proceedings Paper

Mask industry assessment trend analysis
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Paper Abstract

Microelectronics industry leaders routinely name mask cost and cycle time as top issues of concern. In 2002, a survey was created with support from SEMATECH and administered by SEMI North America to gather information about the mask industry as an objective assessment of its overall condition. The survey is designed with the input of mask technologists from semiconductor manufacturers, merchant mask suppliers, and makers of mask equipment. The 2005 survey was the fourth in the current series of annual surveys. The survey data can be used as a baseline for the mask industry and the microelectronics industry to gain a perspective on the technical and business status of the mask industry. The results may be used to guide future investments on critical path issues. Questions are grouped into categories: general business profile information, data processing, yields and yield loss mechanisms, delivery times, returns and services, operating cost factors, and equipment utilization. Because the questions covering operating cost factors and equipment utilization were just added to the survey, no trend analysis is possible. Within each category are many questions that together create a detailed profile of both the business and technical status of the mask industry. The assessment participation has changed from year to year. The 2005 survey, for example, includes inputs from eight major global merchant and captive mask manufacturers whose revenue represents approximately 85% of the global mask market.

Paper Details

Date Published: 21 June 2006
PDF: 10 pages
Proc. SPIE 6281, 22nd European Mask and Lithography Conference, 628103 (21 June 2006); doi: 10.1117/12.692628
Show Author Affiliations
Gilbert Shelden, Shelden Consulting (United States)
Scott Hector, Freescale Semiconductor (United States)
Pat Marmillion, SEMATECH/IBM Corp. (United States)
Michael Lercel, SEMATECH/IBM Corp. (United States)


Published in SPIE Proceedings Vol. 6281:
22nd European Mask and Lithography Conference
Uwe F. W. Behringer, Editor(s)

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