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Proceedings Paper

Designing lithographic objectives by constructing saddle points
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Paper Abstract

Optical designers often insert or split lenses in existing designs. Here, we present, with examples from Deep and Extreme UV lithography, an alternative method that consists of constructing saddle points and obtaining new local minima from them. The method is remarkable simple and can therefore be easily integrated with the traditional design techniques. It has significantly improved the productivity of the design process in all cases in which it has been applied so far.

Paper Details

Date Published: 13 July 2006
PDF: 7 pages
Proc. SPIE 6342, International Optical Design Conference 2006, 63420L (13 July 2006); doi: 10.1117/12.692250
Show Author Affiliations
Oana Marinescu, Delft Univ. of Technology (Netherlands)
Florian Bociort, Delft Univ. of Technology (Netherlands)

Published in SPIE Proceedings Vol. 6342:
International Optical Design Conference 2006
G. Groot Gregory; Joseph M. Howard; R. John Koshel, Editor(s)

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