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Proceedings Paper

On objectives and algorithms of inverse methods in microlithography
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Paper Abstract

Inverse microlithography solves problem of finding the best mask to print target layout. We present theoretical analysis of objective functions and algorithms that are used for inversion. We analyze complexity, speed and limitations of the inverse algorithms.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 63494R (20 October 2006); doi: 10.1117/12.691810
Show Author Affiliations
Yuri Granik, Mentor Graphics Corp. (United States)
Kyohei Sakajiri, Mentor Graphics Corp. (United States)
Shumay Shang, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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