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Proceedings Paper

Design-based mask metrology hot spot classification and recipe making through random pattern recognition method
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Paper Abstract

Design Based Metrology (DBM) requires an integrated process from design to metrology, and the very first and key step of this integration is to translate design CD lists to metrology measurement recipes. Design CD lists can come from different sources, such as design rule check, OPC validation, or yield analysis. These design CD lists can not be directly used to create metrology tool recipes, since tool recipe makers usually require specific information of each CD site, or a measurement matrix. The manual process to identify measurement matrix for each design CD site can be very difficult, especially when the list is in hundreds or more. This paper will address this issue and propose a method to automate Design CD Identification (DCDI), using a new CD Pattern Vector (CDPV) library.

Paper Details

Date Published: 20 October 2006
PDF: 6 pages
Proc. SPIE 6349, Photomask Technology 2006, 63490O (20 October 2006); doi: 10.1117/12.690988
Show Author Affiliations
Ying Cui, Intel Corp. (United States)
Kiho Baik, Intel Corp. (United States)
Bob Gleason, Intel Corp. (United States)
Malahat Tavassoli, Intel Corp. (United States)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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