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Proceedings Paper

Mechanism of megasonic damages for micropatterns
Author(s): Y. Suwa; S. Shimada; A. Shigihara; H. Ishii; Y. Shoji; M. Otsuki; A. Naito; S. Sasaki; H. Mohri; N. Hayashi
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Paper Abstract

Photomasks with various sub resolution assist feature (SRAF) were vigorously cleaned by a megasonic tool, and their pattern damage, "SRAF-missing", was investigated. As a result, it was found that SRAF-missing can occur at a low probability by the megasonic cleaning and the probability significantly depends on SRAF size, especially width. With smaller than 100 nm width, SRAF-missing probability rapidly increased with SRAF width reduction. In addition, the relationship between SRAF-missing and acoustic pressure was investigated, and at the same time that between particle removal efficiency (PRE) and acoustic pressure was also investigated. As a result, SRAF-missing and PRE showed a trade-off relationship. Using all results, an experimental equation was provided. After verification by additional experiments, some simulations were done, and megasonic cleaning subject was predicted for the 45nm and 32nm-node mask fabrication.

Paper Details

Date Published: 20 October 2006
PDF: 9 pages
Proc. SPIE 6349, Photomask Technology 2006, 63492X (20 October 2006); doi: 10.1117/12.690558
Show Author Affiliations
Y. Suwa, Dai Nippon Printing Co., Ltd. (Japan)
S. Shimada, Dai Nippon Printing Co., Ltd. (Japan)
A. Shigihara, Dai Nippon Printing Co., Ltd. (Japan)
H. Ishii, Dai Nippon Printing Co., Ltd. (Japan)
Y. Shoji, Dai Nippon Printing Co., Ltd. (Japan)
M. Otsuki, Dai Nippon Printing Co., Ltd. (Japan)
A. Naito, Dai Nippon Printing Co., Ltd. (Japan)
S. Sasaki, Dai Nippon Printing Co., Ltd. (Japan)
H. Mohri, Dai Nippon Printing Co., Ltd. (Japan)
N. Hayashi, Dai Nippon Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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