Share Email Print
cover

Proceedings Paper

Wavefront analysis and beam profiling from 40 eV up to 40 keV
Author(s): Thomas Nisius; David Schäfer; Rolf Früke; Thomas Wilhein
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

A wavefront sensing and beam monitoring system applicable to various kinds of X-ray and EUV sources like synchrotron radiation from undulators, X-ray lasers and laser induced plasma sources in the spectral range from 40 eV up to 40 keV is presented. One of the main applications will be the feedback for adaptive optical elements, e.g. deformable mirrors, for X-rays above 10 keV. It also provides the possibility to estimate the source dimension and distance. The wavefront sensor is based on a modified Hartmann setup; the beam is sampled by a rectangular grid and generates a distorted image on the detector. Comparison of this image with a known reference yields the wavefront's local slope at an extensive number of points. However, the Hartmann pattern is not directly imaged but is converted to the visible spectral range by a scintillator. This offers the possibility to use off the shelf cameras for image acquisition. First measurements, performed at the VUV-FEL (DESY, Hamburg) and at ELETTRA (Trieste), show the feasibility of this approach. The Hartmann principle offers the advantage to measure both, intensity and phase, thus allowing to reconstruct not only the wavefront but also the beam profile. Wavefront resolution of up to λ/100 (λ = 1 nm) can be achieved. The intensity profile and the beam shape can be measured with a spatial resolution better than 10 μm. With the current setup it is also possible to analyze the temporal and spatial stability of the source.

Paper Details

Date Published: 29 August 2006
PDF: 7 pages
Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63171E (29 August 2006); doi: 10.1117/12.690297
Show Author Affiliations
Thomas Nisius, Univ. of Applied Sciences Koblenz (Germany)
David Schäfer, Univ. of Applied Sciences Koblenz (Germany)
Rolf Früke, Univ. of Applied Sciences Koblenz (Germany)
Thomas Wilhein, Univ. of Applied Sciences Koblenz (Germany)


Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

© SPIE. Terms of Use
Back to Top