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Proceedings Paper

A new model of haze generation and storage-life-time estimation for mask
Author(s): S. Shimada; N. Kanda; N. Takahashi; H. Nakajima; H. Tanaka; H. Ishii; Y. Shoji; M. Otsuki; A. Naito; N. Hayashi
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Paper Abstract

After quartz blanks with various sulfate ion amount on the surfaces were exposed by an ArF laser, growing defects, haze, on the surfaces were consequently counted by an inspection tool. As a result, the number of haze largely depends on the sulfate ion amount, and it is found that no haze is generated when the sulfate ion amount is smaller than a threshold value. A new haze generation model is provided to explain the threshold phenomenon. And then storage impact on increase of the sulfate ion amount was investigated. The sulfate ion amount increases with storage time and airborne SOx concentration. From the results, the adsorption coefficient of an extended Langmuir equation was calculated, and the adsorption phenomenon was analyzed in detail. Simulation results show that it is recommended, regarding for storage environment, to keep under 0.01 ppbv airborne SOx concentration in order to prevent haze for one year.

Paper Details

Date Published: 20 October 2006
PDF: 7 pages
Proc. SPIE 6349, Photomask Technology 2006, 63491H (20 October 2006); doi: 10.1117/12.688936
Show Author Affiliations
S. Shimada, Dai Nippon Printing Co., Ltd. (Japan)
N. Kanda, Dai Nippon Printing Co., Ltd. (Japan)
N. Takahashi, Dai Nippon Printing Co., Ltd. (Japan)
H. Nakajima, Dai Nippon Printing Co., Ltd. (Japan)
H. Tanaka, Dai Nippon Printing Co., Ltd. (Japan)
H. Ishii, Dai Nippon Printing Co., Ltd. (Japan)
Y. Shoji, Dai Nippon Printing Co., Ltd. (Japan)
M. Otsuki, Dai Nippon Printing Co., Ltd. (Japan)
A. Naito, Dai Nippon Printing Co., Ltd. (Japan)
N. Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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