Share Email Print
cover

Proceedings Paper

Mastering double exposure process window aware OPC by means of virtual targets
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

This paper addresses a challenge to the concept of process window OPC (PWOPC) by investigating the dimensional control of effectively non-printing features to improve the process window (PW) of the primary layout. It is shown based on a double exposure (DE) alternating phase-shift mask (altPSM) process that neglecting the impact of final mask dimensions forming intermediate images in resist (which are subsequently removed with a second exposure) potentially leads to a significant variation in the available focus budget of neighboring linewidth-critical feature dimensions. Various rules-based and model-based options of introducing virtual OPC targets into the OPC flow are discussed as an efficient mean to allow the OPC to take process window considerations into account. The paper focuses especially on the mechanics of how in detail those virtual targets support the beneficial OPC convergence of affected edges. Finally, experimental proof is shown that introducing non-printing, virtual targets being considered as actual targets during OPC ensures enhanced through focus line width stability and hence making the OPC solution well aware of process window aspects.

Paper Details

Date Published: 20 October 2006
PDF: 11 pages
Proc. SPIE 6349, Photomask Technology 2006, 63491W (20 October 2006); doi: 10.1117/12.687609
Show Author Affiliations
Henning Haffner, Infineon Technologies AG (United States)
Zachary Baum, IBM Semiconductor Research and Development Ctr. (United States)
Carlos Fonseca, IBM Semiconductor Research and Development Ctr. (United States)
Scott Halle, IBM Semiconductor Research and Development Ctr. (United States)
Lars Liebmann, IBM Semiconductor Research and Development Ctr. (United States)
Arpan Mahorowala, IBM Semiconductor Research and Development Ctr. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

© SPIE. Terms of Use
Back to Top