Share Email Print
cover

Proceedings Paper

Feasibility study of mask fabrication in double exposure technology
Author(s): Jong Gul Doh; Sang Hee Lee; Je Bum Yoon; Doo Youl Lee; Seong Yong Cho; Byung Gook Kim; Seong Woon Choi; Woo Sung Han
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

With decreasing the design node, there are some candidates for the optical lithography technology. Double Exposure Technology (DET) is the one of the solution to extend the resolution limit down to k1 less than 0.25 for the next generation devices. To accomplish DET, photomask MTT, CD uniformity, and the overlay between the layers for the dual exposure are important as the photomask process aspect. MTT and CD uniformity have been frequently discussed for Single Exposure Technology (SET), but the overlay and the registration have not been discussed yet with the view of DET. In this work, the feasibility of mask fabrication, especially the overlay and the registration for DET are analyzed. The current mask limit of DET is discussed considering MTT, uniformity, and overlay.

Paper Details

Date Published: 20 October 2006
PDF: 9 pages
Proc. SPIE 6349, Photomask Technology 2006, 63491U (20 October 2006); doi: 10.1117/12.686523
Show Author Affiliations
Jong Gul Doh, Samsung Electronics Co., Ltd. (South Korea)
Sang Hee Lee, Samsung Electronics Co., Ltd. (South Korea)
Je Bum Yoon, Samsung Electronics Co., Ltd. (South Korea)
Doo Youl Lee, Samsung Electronics Co., Ltd. (South Korea)
Seong Yong Cho, Samsung Electronics Co., Ltd. (South Korea)
Byung Gook Kim, Samsung Electronics Co., Ltd. (South Korea)
Seong Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Woo Sung Han, Samsung Electronics Co., Ltd. (South Korea)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

© SPIE. Terms of Use
Back to Top