
Proceedings Paper
Analysis of optical lithography capabilities of pixelized photomasks and spatial light modulatorsFormat | Member Price | Non-Member Price |
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Paper Abstract
The models based on pixelized representation of the photomask have been employed by several authors in order to
provide the systematic framework for design of photomask patterns resulting in images with desired optimal properties.
One possibility to directly implement such pixel-based optimal mask patterns arises in Optical Maskless Lithography
(OML). In one implementation of OML, spatial light modulators (SLMs) are used instead of the photomask. Each SLM
may have millions of pixels that can individually change their optical properties utilizing one or the other physical
modulation principle (e.g. pistoning micro-mirror pixels or tilting micro-mirror pixels). One important question,
applicable to both SLMs used in OML and pixelized photomasks, is: how well is a particular pixel modulation principle
suited to obtain the optimal image? We discuss the ways to answer this question, derived from the new methodology of
OML rasterization algorithms. The illustrating examples are presented for traditional photomasks (AttPSM) and the
SLMs with pistoning micro-mirror pixels. Based on this analysis, we present new examples demonstrating the concept
and advantages of "truly maskless" optical maskless lithography.
Paper Details
Date Published: 20 October 2006
PDF: 12 pages
Proc. SPIE 6349, Photomask Technology 2006, 63490R (20 October 2006); doi: 10.1117/12.686518
Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)
PDF: 12 pages
Proc. SPIE 6349, Photomask Technology 2006, 63490R (20 October 2006); doi: 10.1117/12.686518
Show Author Affiliations
Azat Latypov, KLA-Tencor Corp. (United States)
Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)
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