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Proceedings Paper

Multi-point CD measurement method to evaluate pattern fidelity and performance of mask
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Paper Abstract

As mask feature size is shrinking, required accuracy and repeatability of mask CD measurement is more severe. CD-SEM which is usually used to measure below 0.5um pattern shows the degradation of repeatability by the sparkle noise. To reduce this, larger ROI (range of interest) is recommended on line and space patterns. But this wide ROI is difficult to use on Hole or isolated patterns. In this paper, anisotropic diffusion filtering method will be introduced to replace the ROI, and evaluated on various patterns such as holes and isolated patterns. It can also reduce the effects of defocus of CD-SEM and enhance the repeatability of CD-SEM. And multi-point CD measurement technique is described to reduce the local CD errors on CD uniformity of mask which is usual on one dimensional CD measurement conventionally. Using these methods, local CD uniformity and global CD uniformity of masks which is the key performance of mask quality can be measured more exactly compared to old CD measurement method. And we can give correct information of mask to reduce global CD uniformity by process tuning such as FEC (Fogging Effect Correction) or development process.

Paper Details

Date Published: 20 October 2006
PDF: 9 pages
Proc. SPIE 6349, Photomask Technology 2006, 634944 (20 October 2006); doi: 10.1117/12.686473
Show Author Affiliations
Munsik Kim, Hynix Semiconductor Inc. (South Korea)
Hyemi Lee, Hynix Semiconductor Inc. (South Korea)
Kanjoon Seo, Hynix Semiconductor Inc. (South Korea)
Dongwook Lee, Hynix Semiconductor Inc. (South Korea)
Yongkyoo Choi, Hynix Semiconductor Inc. (South Korea)
Sunghyun Oh, Hynix Semiconductor Inc. (South Korea)
Oscar Han, Hynix Semiconductor Inc. (South Korea)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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