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Proceedings Paper

Dependency of EUV mask defects on substrate defects
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Paper Abstract

Extreme ultraviolet (EUV) mask blanks must have nearly zero defects larger than 30 nm. Mask blank defects are an accumulation of defects present on the substrate, defects added during the multilayer (ML) deposition process, and defects added by handling the mask blank. A majority of the detectable defects are already present on the substrate before the ML deposition. However, very few of the defects present on the substrate before the ML deposition are detectable. This raises the question of whether the substrate's surface condition contributes to the total number of defects on the mask blank. Here the results of investigations on the relation between the total number of defects on the multilayer and the substrate surface condition are presented. The final surface condition is determined by the mask cleaning process. Correlation studies between defect maps before and after multilayer deposition are presented, and the relation between final defect size on the multilayer and substrate are discussed. SEMATECH's Mask Blank Development Center (MBDC) has a unique capability to characterize the surface of EUV glass substrates by atomic force microscopy (AFM), scanning electron microscopy (SEM), surface energy measurement, and zeta potential metrology. A series of experiments were performed in which different cleaning processes were used to modify the substrate surface condition before multilayer deposition. The effect of the cleaning process on the number of pits and particles after ML deposition was examined. The results indicate that although there is a direct relationship between the number of defects remaining on the substrate and mask blank defects after multilayer deposition, the variation in the total number of defects on the mask blank mainly corresponds to pits and particles already present on the substrate before cleaning and are not the result of the cleaning processes that were used before multilayer deposition.

Paper Details

Date Published: 20 October 2006
PDF: 9 pages
Proc. SPIE 6349, Photomask Technology 2006, 63493C (20 October 2006); doi: 10.1117/12.686437
Show Author Affiliations
Sean Eichenlaub, Sematech Inc. (United States)
Abbas Rastegar, Sematech Inc. (United States)
Vivek Kapila, Sematech Inc. (United States)
Yoshiaki Ikuta, Sematech Inc. (United States)
Pat Marmillion, Sematech Inc. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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