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Proceedings Paper

Experimental investigation of photomask with near-field polarization imaging
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Paper Abstract

Near-field induced polarization imaging with a solid immersion lens (SIL) is used to provide high lateral resolution for both native and induced polarization (cross polarized) images. A new technique is used to obtain height information from the near-field induced polarization image. An AltPSM mask sample is studied with this imaging technique, and compared to imaging with an AFM and a PSI interferometer. Topological data from the near-field induced polarization image are within a few nanometer of the AFM result, without contacting surface. In addition, features due to undercutting the Cr are observable in the induced polarization image.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 634953 (20 October 2006); doi: 10.1117/12.686420
Show Author Affiliations
Tao Chen, College of Optical Sciences, Univ. of Arizona (United States)
Tom D. Milster, College of Optical Sciences, Univ. of Arizona (United States)
Seung-Hune Yang, College of Optical Sciences, Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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