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Proceedings Paper

32-nm node flash contact hole printing using double patterning, CPL mask, and hyper-NA immersion lithography with optimized illumination
Author(s): Ting Chen
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Paper Details

Date Published:
Proc. SPIE 6349, Photomask Technology 2006, 634911; doi: 10.1117/12.686411
Show Author Affiliations
Ting Chen, ASML MaskTools Inc. (United States)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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