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Proceedings Paper

Evaluation of writing strategy with one and two pass on OPC technology using EBM writing system
Author(s): Chen-Rui Tseng; Kevin Cheng; David Lee; Sheng-Bay Yang; Chun-Hung Wu
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Paper Abstract

Evaluation of the writing strategy effects with one and two pass exposed by EBM-4000 variable-shaped e-beam lithography tool is a new class of mask making especially for OPC technology. The EBM-4000 writing system features a variable shaped beam, 50 KeV accelerating voltage, a continuous stage, and incorporates some technologies. Obviously, many examples exist of systems which add parallelism to the exposure process by using multiple pass. The standard writing strategy of EBM-4000 writing system is four pass. We evaluated and confirmed the two pass exposed by EBM-4000 writing system for 90 to 130 nm node successfully. The results of the two pass improved throughput and had excellent performances. In the present paper, the one and two pass exposed by EBM-4000 writing system has been investigated. The objective of the present work is to direct the performances for several design of OPC verification like serifs and jogs. We will provide the actual measurement data and images obtained on CD-SEM for the OPC pattern exposed with one and two pass. In this paper, the characterization data will also present the applicable results such as resolution, position accuracy, global and local CD uniformity, CD linearity, and roughness. We have evaluated and confirmed the one and two pass writing strategies for the EBM-4000 writing system. The writing strategies are especially desirable for unique properties due to the best conditions of the CAR process.

Paper Details

Date Published: 20 October 2006
PDF: 10 pages
Proc. SPIE 6349, Photomask Technology 2006, 63494C (20 October 2006); doi: 10.1117/12.686377
Show Author Affiliations
Chen-Rui Tseng, Taiwan Mask Corp. (Taiwan)
Kevin Cheng, Taiwan Mask Corp. (Taiwan)
David Lee, Taiwan Mask Corp. (Taiwan)
Sheng-Bay Yang, Taiwan Mask Corp. (Taiwan)
Chun-Hung Wu, Taiwan Mask Corp. (Taiwan)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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