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Proceedings Paper

Influence of design shrinks and proximity influence distance on flattening of optical hierarchy during RET
Author(s): John L. Nistler; Koby Duckworth
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Paper Abstract

As geometries shrink faster than the actual wavelength used for exposure, the Proximity influence distance, or PID of nearest neighbor features starts to impact not only the overall RET of unit cells in the design library but also the flattening of the hierarchy of the electronic design increasing the overall database size, computational times and respective memory requirements per computational node. In this paper we explore the impact of different PID values in relation to the overall flattening of hierarchy, time to market and the impact on RET complexity as dimensions are shrunk in overall design.

Paper Details

Date Published: 20 October 2006
PDF: 9 pages
Proc. SPIE 6349, Photomask Technology 2006, 634925 (20 October 2006); doi: 10.1117/12.686359
Show Author Affiliations
John L. Nistler, PSIDA Lithography & Software LLC (United States)
Koby Duckworth, PSIDA Lithography & Software LLC (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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