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Proceedings Paper

Automated mask qualification with new CD metrology in CATS environment
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Paper Abstract

With every new process generation mask complexity and costs continue to increase, driving new requirements for critical dimension control and mask qualification. Identifying and categorizing features to be measured and verified during mask qualification has now become critical to ensure high yielding masks. Traditional line width and spacing measurements are no longer sufficient for CD metrology systems. Next-generation CD-SEM systems and software tools now include more complex mask metrology requirements including measurements of pitch, "ternary contact", corner rounding, overlay, and line-edge roughness. Additionally these systems have started providing the capability for multiple measurement sites within a single field-of-view. In advanced mask production facilities, mask qualification recipes are commonly generated offline to improve the quality and efficiency of such qualifications. Offline recipe generation has become even more important since new process generations require an increasing number of measurements per mask. This paper describes offline recipe generation procedures using CATSTM marking, also referred to as 'software tools' to utilize the new features of advanced CD-SEM metrology systems.

Paper Details

Date Published: 20 October 2006
PDF: 7 pages
Proc. SPIE 6349, Photomask Technology 2006, 634942 (20 October 2006); doi: 10.1117/12.686276
Show Author Affiliations
Herman Boerland, Synopsys, Inc. (United States)
Ronald J. Lesnick, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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