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Proceedings Paper

Development and application of UV excimer lamps from 354nm-126nm
Author(s): Ian W. Boyd; Irving I. Liaw
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Paper Abstract

The use of high intensity ultraviolet (UV) and vacuum ultraviolet (VUV) radiation generated from decaying excimer complexes through dielectric barrier discharge (silent discharges) sources for the purposes of surface processing and modification is reviewed. Such sources provide a singular dominant narrow-band emission at various wavelengths(λ) between 126 - 354 nm. The remarkable simplicity of supplying these sources and flexibility of their geometric configurations allow them to be coupled in parallel thus providing high photon fluxes over large areas. The monochromatic selectivity allows for application to process and chemical pathway specific tasks by simple variation of the discharge gas mixture. These sources are an interesting addition to and as an alternative to lasers for large scale industrial applications and their unique characterisitics have led to their use in a number of low-temperature material modification techniques, some of which are reviewed here. These include the photo-induced low-temperature formation of oxynitride layers, high-κ thin film layers and the post-deposition annealing of pulsed laser deposited (PLD) thin films.

Paper Details

Date Published: 7 June 2006
PDF: 16 pages
Proc. SPIE 6261, High-Power Laser Ablation VI, 626104 (7 June 2006); doi: 10.1117/12.686233
Show Author Affiliations
Ian W. Boyd, Univ. College London (United Kingdom)
Irving I. Liaw, Univ. College London (United Kingdom)

Published in SPIE Proceedings Vol. 6261:
High-Power Laser Ablation VI
Claude R. Phipps, Editor(s)

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