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Proceedings Paper

Benchmarking the productivity of photomask manufacturers
Author(s): C. Neil Berglund; Charles M. Weber; Patricia Gabella
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Paper Abstract

A survey-based, empirical study that benchmarks the productivity of photomask manufacturers has led to some significant conclusions. Firstly, the wide variation in the productivity indicators from company to company suggests that all participants may have significant cost-reduction opportunities within their operations. Secondly, the high downtime of pattern generation tools is limiting productivity. Thirdly, producing smaller feature sizes is correlated to an investment in engineering and experimentation capacity. It could not be confirmed that photomask manufacturers are successfully taking advantage of economies of scale.

Paper Details

Date Published: 20 October 2006
PDF: 10 pages
Proc. SPIE 6349, Photomask Technology 2006, 634927 (20 October 2006); doi: 10.1117/12.686227
Show Author Affiliations
C. Neil Berglund, Portland State Univ. (United States)
Charles M. Weber, Portland State Univ. (United States)
Patricia Gabella, Sematech (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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