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Proceedings Paper

Analysis of the Vistec LMS IPRO3 performance and accuracy enhancement techniques
Author(s): Gunter Antesberger; Sven Knoth; Frank Laske; Jens Rudolf; Eric Cotte; Benjamin Alles; Carola Bläsing; Wolfgang Fricke; Klaus Rinn
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Paper Abstract

Following the international technology roadmap for semiconductors the image placement precision for the 65nm technology node has to be 7nm. In order to be measurement capable, the measurement error of a 2D coordinate measurement system has to be close to 2nm. For those products, we are using the latest Vistec registration metrology tool, the LMS IPRO3. In this publication we focus on the tool performance analysis and compare different methodologies. Beside the well-established ones, we are demonstrating the statistical method of the analysis of variance (ANOVA) as a powerful tool to quantify different measurement error contributors. Here we deal with short-term, long-term, orientation-dependent and tool matching errors. For comparison reasons we also present some results based on LMS IPRO2 and LMS IPRO1 measurements. Whereas the short-term repeatability and long-term reproducibility are more or less given by the tool set up and physical facts, the orientation dependant part is a result of a software correction algorithm. We finally analyse that kind of residual tool systematics and test some improvement strategies.

Paper Details

Date Published: 20 October 2006
PDF: 10 pages
Proc. SPIE 6349, Photomask Technology 2006, 63491M (20 October 2006); doi: 10.1117/12.686089
Show Author Affiliations
Gunter Antesberger, Advanced Mask Technology Ctr. (Germany)
Sven Knoth, Advanced Mask Technology Ctr. (Germany)
Frank Laske, Advanced Mask Technology Ctr. (Germany)
Jens Rudolf, Advanced Mask Technology Ctr. (Germany)
Eric Cotte, Advanced Mask Technology Ctr. (Germany)
Benjamin Alles, TU München (Germany)
Carola Bläsing, Vistec Semiconductor Systems GmbH (Germany)
Wolfgang Fricke, Vistec Semiconductor Systems GmbH (Germany)
Klaus Rinn, Fachhochschule Gießen-Friedberg (Germany)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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