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Proceedings Paper

Solve the DFM issues at the design stage
Author(s): Ching-Heng Wang; Chi-Yuan Hung; Frank Li
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Date Published:
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Proc. SPIE 6349, Photomask Technology 2006, ; doi: 10.1117/12.685745
Show Author Affiliations
Ching-Heng Wang, Semiconductor Manufacturing International Corp. (China)
Chi-Yuan Hung, Semiconductor Manufacturing International Corp. (China)
Frank Li, Anchor Semiconductor Inc. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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