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Proceedings Paper

More evolved PGSD (proximity gap suction developer) for controlling movement of dissolution products
Author(s): Hideaki Sakurai; Yukio Oppata; Koji Murano; Mari Sakai; Masamitsu Itoh; Hidehiro Watanabe; Hideo Funakoshi; Kotaro Ooishi; Yoshiki Okamoto; Masatoshi Kaneda; Shigenori Kamei; Naoya Hayashi
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Paper Abstract

PGSD is one of the solutions as a developer of 70 nm node generation mask fabrication. To make 55 nm node generation mask, CD error induced by loading effect (loading-effect-induced CD error) must be reduced. As is generally known, primary cause of loading effect is dissolution products that hinder the progress of development. We think that it is the key in development technology to control movement of dissolution products and to disperse dissolution products uniformly for minimizing the loading-effect-induced CD error. In this paper, we propose a new concept and procedure to optimize the movement direction and the amount of dissolution products.

Paper Details

Date Published: 20 October 2006
PDF: 8 pages
Proc. SPIE 6349, Photomask Technology 2006, 63494J (20 October 2006); doi: 10.1117/12.685740
Show Author Affiliations
Hideaki Sakurai, Toshiba Corp. (Japan)
Yukio Oppata, Toshiba Corp. (Japan)
Koji Murano, Toshiba Corp. (Japan)
Mari Sakai, Toshiba Corp. (Japan)
Masamitsu Itoh, Toshiba Corp. (Japan)
Hidehiro Watanabe, Toshiba Corp. (Japan)
Hideo Funakoshi, Tokyo Electron Kyushu Ltd. (Japan)
Kotaro Ooishi, Tokyo Electron Kyushu Ltd. (Japan)
Yoshiki Okamoto, Tokyo Electron Kyushu Ltd. (Japan)
Masatoshi Kaneda, Tokyo Electron Kyushu Ltd. (Japan)
Shigenori Kamei, Tokyo Electron Kyushu Ltd. (Japan)
Naoya Hayashi, Dai Nippon Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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