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Proceedings Paper

Distributed computing in mask data preparation for 45-nm node and below
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Paper Abstract

Data Preparation for photomask manufacturing is characterized by computational complexity that grows faster than the evolution of computer processor ability. Parallel processing generally addresses this problem and is an accepted mechanism for preparing mask data. One judges a parallel software implementation by total time, stability and predictability of computation. We apply several fundamental techniques to dramatically improve these metrics for a parallel, distributed MDP system. This permits the rapid, predictable computation of the largest mask layouts on conventional computing clusters.

Paper Details

Date Published: 20 October 2006
PDF: 13 pages
Proc. SPIE 6349, Photomask Technology 2006, 63493T (20 October 2006); doi: 10.1117/12.685144
Show Author Affiliations
Weidong Zhang, Mentor Graphics Corp. (United States)
Emile Sahouria, Mentor Graphics Corp. (United States)
Steffen Schulze, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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