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Proceedings Paper

Introduction of a die-to-database verification tool for mask geometry NGR4000
Author(s): Michael J. Hoffman; Tadashi Kitamura; Kazufumi Kubota; Toshiaki Hasebe; Shinichi Nakazawa; Toshifumi Tokumoto; Masatoshi Tsuneoka; Masahiro Yamamoto; Masahiro Inoue
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Paper Abstract

The NGR4000 enables high precision verification of mask features, by matching Scanning Electron Microscope (SEM) images of the mask features to their intended mask design data. The system detects defects in Critical Dimensions (CDs) and feature placement relative to the large Field of View (FOV). This tool is optimized to determine pattern fidelity and perform CD measurements with repeatability well ahead of ITRS roadmap requirements. This paper will show examples and describe the advantages of mass CD measurements, and relative feature placement accuracy as new technique to define pattern fidelity.

Paper Details

Date Published: 20 October 2006
PDF: 6 pages
Proc. SPIE 6349, Photomask Technology 2006, 634940 (20 October 2006); doi: 10.1117/12.684984
Show Author Affiliations
Michael J. Hoffman, NanoGeometry Research Inc. (Japan)
Tadashi Kitamura, NanoGeometry Research Inc. (Japan)
Kazufumi Kubota, NanoGeometry Research Inc. (Japan)
Toshiaki Hasebe, NanoGeometry Research Inc. (Japan)
Shinichi Nakazawa, NanoGeometry Research Inc. (Japan)
Toshifumi Tokumoto, NanoGeometry Research Inc. (Japan)
Masatoshi Tsuneoka, NanoGeometry Research Inc. (Japan)
Masahiro Yamamoto, NanoGeometry Research Inc. (Japan)
Masahiro Inoue, Topcon Corp. (Japan)

Published in SPIE Proceedings Vol. 6349:
Photomask Technology 2006
Patrick M. Martin; Robert J. Naber, Editor(s)

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