Share Email Print
cover

Proceedings Paper

SXR optical diagnostics of capillary discharge plasma
Author(s): L. Pina; A. Jancarek; M. Vrbova; M. Tamas; J. Blazej; R. Havlikova; P. Vrba; G. Tomassetti; A. Ritucci
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Pinching capillary discharge in nitrogen is investigated for the purpose of development of laser recombination pumping. An apparatus, previously realized for argon capillary laser pumping, was used to understand details of pinching mechanism and emission characteristics for capillary filled by nitrogen. Time dependences of radiation intensities emitted in the wavelength range 1.9 - 2.5 nm and time integrated in the spectral range 10 - 20 nm were measured under various pressures. A computer model is used to describe the pinch dynamics and to estimate the radiation characteristics. EUV reflection grating spectrometer coupled to BI CCD camera and filtered PIN diode were used for time integrated and time resolved spectral measurements respectively. The measured profiles of radiation intensities are compared with the computer simulations of time dependences of selected energy level populations that correspond to the hydrogen- and helium- like ion line emission in the detected spectral range. Complex method for spectral image restoration was developed.

Paper Details

Date Published: 13 September 2006
PDF: 11 pages
Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631707 (13 September 2006); doi: 10.1117/12.684051
Show Author Affiliations
L. Pina, Czech Technical Univ. (Czech Republic)
A. Jancarek, Czech Technical Univ. (Czech Republic)
M. Vrbova, Czech Technical Univ. (Czech Republic)
M. Tamas, Czech Technical Univ. (Czech Republic)
J. Blazej, Czech Technical Univ. (Czech Republic)
R. Havlikova, Czech Technical Univ. (Czech Republic)
P. Vrba, Institute of Plasma Physics (Czech Republic)
G. Tomassetti, Univ. di l'Aquila (Italy)
A. Ritucci, Univ. di l'Aquila (Italy)


Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

© SPIE. Terms of Use
Back to Top