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Proceedings Paper

EUV radiation from gas-puff laser plasma focused by multi-foil optics
Author(s): L. Pina; A. Bartnik; H. Fiedorowicz; R. Havlikova; R. Hudec; A. Inneman; K. Jakubczak; V. Semencova; L. Sveda
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Paper Abstract

We present the recent progress in high intensity micro focused EUV beam generation. Ellipsoidal thin glass foils were used in Multi-foil optical systems for focusing radiation in 50 eV to 150 eV energy band from gas-puff laser plasma source. Multifoil optic (MFO) condenser was designed and tested for applications with Xe laser plasma gas-puff source. High intensity EUV beam focal spot was recorded, analyzed and compared with theoretical results from computer ray-tracing. Direct EUV lithography using radiation induced decomposition and ablation of TEFLON was studied.

Paper Details

Date Published: 29 August 2006
PDF: 9 pages
Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631705 (29 August 2006); doi: 10.1117/12.684031
Show Author Affiliations
L. Pina, Czech Technical Univ. in Prague (Czech Republic)
Ctr. for Advanced X-Ray Technologies, Reflex (Czech Republic)
A. Bartnik, Wojskowa Akademia Techniczna (Poland)
H. Fiedorowicz, Wojskowa Akademia Techniczna (Poland)
R. Havlikova, Czech Technical Univ. in Prague (Czech Republic)
R. Hudec, Astronomical Institute (Czech Republic)
A. Inneman, Ctr. for Advanced X-Ray Technologies, Reflex (Czech Republic)
K. Jakubczak, Wojskowa Akademia Techniczna (Poland)
V. Semencova, Institute of Chemical Technology (Czech Republic)
Ctr. for Advanced X-Ray Technologies, Reflex (Czech Republic)
L. Sveda, Czech Technical Univ. in Prague (Czech Republic)


Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

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