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Proceedings Paper

Development of advanced reticle inspection apparatus for hp 65 nm node device and beyond
Author(s): Nobutaka Kikuiri; Shingo Murakami; Hideo Tsuchiya; Motonari Tateno; Kenichi Takahara; Shinichi Imai; Ryoichi Hirano; Ikunao Isomura; Yoshitake Tsuji; Yukio Tamura; Kenichi Matsumura; Kinya Usuda; Masao Otaki; Osamu Suga; Katsumi Ohira
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Paper Abstract

The usage of ArF immersion lithography for hp 65nm node and beyond leads to the increase of mask error enhancement factor in the exposure process. Wavelength of inspection tool is required to consistent with wavelength of lithography tool. Wavelength consistency becomes more important by the introduction of phase shift mask such as Tri-tone mask and alternating phase shift mask. Therefore, mask inspection system, whose inspection light wavelength is 199nm, has been developed. This system has transmission and reflection inspection mode, and throughput, using 70 nm pixel size, were designed within 2hours per mask. The experimental results show expected advantages for Die-to-Die and Die-to-Database inspection compared with the system using 257nm inspection optics. Shorter wavelength effect makes transmission inspection sensitivity increase, and realizes 40nm size particle inspection. As for the phase shift mask, the difference of gray value between the area with phase defect and without phase defect was clear relatively. In this paper, specifications and design, experimental results are described.

Paper Details

Date Published: 19 May 2006
PDF: 8 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830Y (19 May 2006); doi: 10.1117/12.683579
Show Author Affiliations
Nobutaka Kikuiri, Advanced Mask Inspection Technology Inc. (Japan)
Shingo Murakami, Advanced Mask Inspection Technology Inc. (Japan)
Hideo Tsuchiya, Advanced Mask Inspection Technology Inc. (Japan)
Motonari Tateno, Advanced Mask Inspection Technology Inc. (Japan)
Kenichi Takahara, Advanced Mask Inspection Technology Inc. (Japan)
Shinichi Imai, Advanced Mask Inspection Technology Inc. (Japan)
Ryoichi Hirano, Advanced Mask Inspection Technology Inc. (Japan)
Ikunao Isomura, Advanced Mask Inspection Technology Inc. (Japan)
Yoshitake Tsuji, Advanced Mask Inspection Technology Inc. (Japan)
Yukio Tamura, Advanced Mask Inspection Technology Inc. (Japan)
Kenichi Matsumura, Advanced Mask Inspection Technology Inc. (Japan)
Kinya Usuda, Advanced Mask Inspection Technology Inc. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)
Osamu Suga, Semiconductor Leading Edge Technologies, Inc. (Japan)
Katsumi Ohira, Semiconductor Leading Edge Technologies, Inc. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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