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Proceedings Paper

Metrology in linear measurements of nano-object elements
Author(s): Yu. A. Novikov; A. V. Rakov; P. A. Todua
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Paper Abstract

Problems of nanoobject linear size measurements on scanning electron microscopes (SEM) have been discussed. It is suggested to use the relief pitch structures of the MShPS-2.0K measure as the line width standard. The geometrical model of signal formation by these structures on high and low voltage SEM's has been described. SEM calibration methods, including measurement of the magnification and diameter of the electron probe, have been developed on the basis of this model. Real structure line width measurement methods have been developed allowing measurements of down to 50 nm.

Paper Details

Date Published: 10 June 2006
PDF: 8 pages
Proc. SPIE 6260, Micro- and Nanoelectronics 2005, 626013 (10 June 2006); doi: 10.1117/12.683398
Show Author Affiliations
Yu. A. Novikov, General Physics Institute (Russia)
A. V. Rakov, General Physics Institute (Russia)
P. A. Todua, Ctr. for Surface and Vacuum Research (Russia)


Published in SPIE Proceedings Vol. 6260:
Micro- and Nanoelectronics 2005
Kamil A. Valiev; Alexander A. Orlikovsky, Editor(s)

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