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Proceedings Paper

Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems
Author(s): Andreas Erdmann; Peter Evanschitzky; Giuseppe Citarella; Tim Fühner; Peter De Bisschop
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Paper Abstract

This paper presents an evaluation of the finite-difference time-domain method (FDTD) and of the waveguide method (WG) for the simulation of typical hyper NA imaging problems. In contrast to previous comparisons of rigorous mask modeling methods, which were restricted to the assessment of few near fields, diffraction efficiencies, or aerial images at fixed imaging configurations, we compare the methods in terms of CPU-time and memory requirements, their capability to predict parameter dependencies and more global lithographic process characteristics such as process windows and through-pitch behavior.

Paper Details

Date Published: 19 May 2006
PDF: 11 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628319 (19 May 2006); doi: 10.1117/12.681872
Show Author Affiliations
Andreas Erdmann, Fraunhofer-Institut of Integrated Systems and Device Technology (Germany)
Peter Evanschitzky, Fraunhofer-Institut of Integrated Systems and Device Technology (Germany)
Giuseppe Citarella, Fraunhofer-Institut of Integrated Systems and Device Technology (Germany)
Tim Fühner, Fraunhofer-Institut of Integrated Systems and Device Technology (Germany)
Peter De Bisschop, IMEC (Belgium)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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