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Proceedings Paper

Assurance of CD for 45-nm half-pitch with immersion microscope
Author(s): Takeshi Yamane; Rikiya Taniguchi; Takashi Hirano
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Paper Abstract

A new calibration method for critical dimension (CD) linearity improvement with an immersion microscope is proposed. Correlation tables of an edge position against CD of the clear pattern and CD of the dark pattern are obtained experimentally. The detected edge position is calibrated with the correction tables. Distance between the calibrated edge positions is output as CD. The experiment result indicates the calibration method improves CD linearity of an immersion microscope. CD repeatability with the calibration method using an immersion microscope is found to be sufficient for 45nm HP masks. As a result, an immersion microscope with our calibration method is available for CD measurement of 45 nm HP masks.

Paper Details

Date Published: 20 May 2006
PDF: 8 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628314 (20 May 2006); doi: 10.1117/12.681866
Show Author Affiliations
Takeshi Yamane, Toshiba Corp. (Japan)
Rikiya Taniguchi, Toshiba Corp. (Japan)
Takashi Hirano, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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