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Proceedings Paper

Novel mask inspection flow for better defect review and analysis
Author(s): Kwon Lim; Jin Hyung Park; Dong Hoon Chung; Seong Woon Choi; Woo Sung Han; Hideo Takizawa; Kouji Miyazaki
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Paper Abstract

Mask inspection plays a pivotal role in current high grade mask making processes and further its importance is getting bigger. The purpose of inspection process is as follows. One is simple sorting of NG masks that have fatal defects with high sensitivity. The other is improvement of total mask manufacturing process and mask quality using defect source analysis. As semiconductor device is getting shrunk down, the influence of mask defect is increasing. Therefore, there are special needs for the efficient use of such expensive inspection machines and the systematic approach of defect analysis. In this paper, we propose novel mask inspection flow to improve mask inspection capacity and systematic defect management. In general, Inspection process is divided by two steps. One is detection of defects and the other is review for defect analysis. Our concept of new inspection flow is adoption of individual defect review system after defect detection in inspection machine. With this new inspection flow using defect review system, we could increase inspection capacity by 30% and set up unified defect analysis hub.

Paper Details

Date Published: 20 May 2006
PDF: 9 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830Z (20 May 2006); doi: 10.1117/12.681858
Show Author Affiliations
Kwon Lim, Samsung Electronics Co., Ltd. (South Korea)
Jin Hyung Park, Samsung Electronics Co., Ltd. (South Korea)
Dong Hoon Chung, Samsung Electronics Co., Ltd. (South Korea)
Seong Woon Choi, Samsung Electronics Co., Ltd. (South Korea)
Woo Sung Han, Samsung Electronics Co., Ltd. (South Korea)
Hideo Takizawa, Lasertec Corp. (Japan)
Kouji Miyazaki, Lasertec Corp. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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