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Proceedings Paper

Inverse lithography technology (ILT): What is the impact to the photomask industry?
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Paper Abstract

Inverse Lithography Technology (ILT) is a rigorous approach to determine the mask shapes that produce the desired on-wafer results. In this paper, we briefly describe an image (or pixel))-based implementation of ILT in comparison to OPC technologies, which are usually edge-based. Such implementation is more computationally scalable and avoids laborious segmentation script-writing, which becomes more complex for newer generations because of complicated proximity effects. In this paper, we will give an overview of ILT, present some simulation and wafer examples to demonstrate the benefit of ILT, clarify common myths about ILT, discuss and show examples to illustrate the impact in every step of the mask making process. Specifically, studies done with several leading mask shops around the world on mask manufacturability (including data fracturing, writing strategy and writing time, mask inspection), will be shown.

Paper Details

Date Published: 20 May 2006
PDF: 11 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830X (20 May 2006); doi: 10.1117/12.681857
Show Author Affiliations
Linyong Pang, Luminescent Technologies, Inc. (United States)
Yong Liu, Luminescent Technologies, Inc. (United States)
Dan Abrams, Luminescent Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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