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Proceedings Paper

Unifying the RET design flow with portable modeling information
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Paper Abstract

The RET Design Flow has become a conglomeration of various point tools and methodologies. Deep sub-wavelength DFM requirements have forced the design and manufacturing communities into very tight collaboration. EDA is also driven to provide an infrastructure to facilitate communication for these communities. Having this infrastructure in place has a direct impact on productivity and quality for which the value added is emphasized here.

Paper Details

Date Published: 20 May 2006
PDF: 6 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832V (20 May 2006); doi: 10.1117/12.681812
Show Author Affiliations
Jason Sweis, Cadence Design Systems, Inc. (United States)
Wolf Staud, Cadence Design Systems, Inc. (United States)
Bob Naber, Cadence Design Systems, Inc. (United States)
Tom Laidig, ASML MaskTools Inc. (United States)
Doug Van Denbroeke, ASML MaskTools Inc. (United States)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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