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Proceedings Paper

From GDSII to OASIS: practical support tools for data processing flow transition
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Paper Abstract

OASIS format has begun to be accepted in the field of mask data processing gradually. Major EDA venders have announced their support of OASIS format and new versions of EDA tools which can handle with OASIS files have been shipped one by one. Still, there are great difficulties to convert all the data processing flow from old GDSII to new OASIS. One of the major issues is a problem of verification. Since all the tools have not been completely stable and reliable, there should be a method to verify whether the data is converted to OASIS without any problems. In addition to that, the integrity of the OASIS files itself have to be checked. In general, OASIS has two aspects for the mask industry. One is a role as a new replacement of GDSII. The other is OASIS.VSB, which is a unified format defined for the description of fractured EB data. SII NanoTechnology has been developing a new software package called SmartOASIS. SmartOASIS provides lots of practical functions to enable easy transition of data processing flow from conventional GDSII or EB formats to OASIS.

Paper Details

Date Published: 20 May 2006
PDF: 9 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832P (20 May 2006); doi: 10.1117/12.681802
Show Author Affiliations
Masakazu Endo, SII NanoTechnology Inc. (Japan)
Kuninori Nishizawa, SII NanoTechnology Inc. (Japan)
Kokoro Kato, SII NanoTechnology Inc. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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