Share Email Print
cover

Proceedings Paper

Shot number estimation for EB direct writing for logic LSI utilizing character-build standard-cell layout technique
Author(s): Yoshihiko Kajiya; Akihiro Nakamura; Masaya Yoshikawa; Takeshi Fujino
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Electron Beam direct writing (EBDW) technology is the most cost-effective lithography tool for small-volume logic-LSI fabrication. The EB exposure time will be greatly reduced by applying character-projection (CP) aperture. But the applicable number of CP aperture is limited to 25-400 depending upon EB lithography apparatus. The cell-based logic LSIs are composed of standard-cells (SCs) whose number is 400-1000. Therefore, it is impossible to implement all SCs as CP apertures, because the SCs are placed to 4-directions in general. We had proposed the new technique named 'Character-Build (CB) standard-cell', and demonstrate the most of the combination-logic SCs can be composed by only 17 CP apertures. In this paper, not only combination-logic SCs but also sequential-logic SCs are considered. The number of EB-shots and the chip-area are estimated for some sample circuits. Compared to the simply-limited SCs, The EB shot number is 30-40% reduced by using proposed CB standard-cell, when the CP aperture numbers are 20-30. Moreover, CB standard-cell was advantageous in the module area. Considering 2-directional placement of SCs, the combination of the EB apparatus with 50-100 CP apertures and the CB standard-cell technique may be the best method for high-speed EB direct-writing.

Paper Details

Date Published: 20 May 2006
PDF: 8 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832M (20 May 2006); doi: 10.1117/12.681798
Show Author Affiliations
Yoshihiko Kajiya, Ritsumeikan Univ. (Japan)
Akihiro Nakamura, Ritsumeikan Univ. (Japan)
Masaya Yoshikawa, Ritsumeikan Univ. (Japan)
Takeshi Fujino, Ritsumeikan Univ. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

© SPIE. Terms of Use
Back to Top