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Proceedings Paper

Hot spot-based judgment methodology for high-end photomask availability for any exposure tools
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Paper Abstract

Small process window in ultra-low k1 lithography (k1<0.35) poses difficulties for judgment of the availability of high-end photomasks for preliminary exposure tools for high volume production ramp-up. Also, our previous judgment flow of high-end photomasks availability has several concerns. Therefore, the ultra-low k1 lithography requires accurate judgment methodologies for high-end photomask availability with short turn-around-time (TAT). In this paper, we propose a new concept concerning hot spot-based judgment flow which consists of two stages for high-end photomask availability. Our proposed flow permits judgment of high-end photomask availability for high volume production ramp-up with short TAT.

Paper Details

Date Published: 20 May 2006
PDF: 9 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832J (20 May 2006); doi: 10.1117/12.681793
Show Author Affiliations
Satoshi Usui, Toshiba Corp. (Japan)
Shigeru Hasebe, Toshiba Corp. (Japan)
Shigeki Nojima, Toshiba Corp. (Japan)
Kohji Hashimoto, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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