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Proceedings Paper

Application of photolithographic simulation and a mask repair system in a production environment
Author(s): Tod Robinson; John Lewellen; Ron Bozak; David A. Lee; Peter Brooker
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Paper Abstract

This work represents one in a series of ongoing papers demonstrating the potential utility of integrating advanced photolithographic simulation software into a mask repair tool to provide immediate defect or repair printability feedback. The equipment used here is an AFM-technology based nanomachining photomask repair tool where the high-accuracy AFM surface topography data is fed directly into software applying rigorous solutions to Maxwell's equations. The nature of these systems allows for process endpoint printability evaluation, not restricted by the optical limitations of any given apparatus, of any micro to nano-scale region of the mask in-situ with the defect repair process. In prior work, the capability of this approach was shown in good correlations to AIMSTM at 248 and 193 nm wavelengths, for binary mask repairs of varying dimensions, with no applied optical aberrations to the simulation. In this examination, the development of this system is taken to its next step by introducing it to a real photomask production environment, using production masks, for performance substantiation. Methodologies are shown for the best use of this system in streamlining the mask production process.

Paper Details

Date Published: 20 May 2006
PDF: 11 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62832B (20 May 2006); doi: 10.1117/12.681782
Show Author Affiliations
Tod Robinson, Rave, LLC (United States)
John Lewellen, Sigma-C Software, Inc. (United States)
Ron Bozak, Rave, LLC (United States)
David A. Lee, Rave, LLC (United States)
Peter Brooker, Sigma-C Software, Inc. (United States)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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