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Proceedings Paper

Influence of the pellicle on final photomask flatness
Author(s): Richard Wistrom; Dennis Hayden; Kenneth Racette; Monica Barrett; Andrew Watts
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Paper Abstract

Photomask pellicles play an important role in determining final photomask flatness, which is important to photomask optical performance. This study explores the impact of the pellicle frame flatness and pellicle-to-mask adhesive on photomask flatness. In addition, the change in mask flatness as a function of time after pellicle mounting is studied. Implications of these results on photomask manufacture and photolithography are discussed.

Paper Details

Date Published: 20 May 2006
PDF: 7 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628326 (20 May 2006); doi: 10.1117/12.681775
Show Author Affiliations
Richard Wistrom, IBM Sytems and Technology Group (United States)
Dennis Hayden, IBM Sytems and Technology Group (United States)
Kenneth Racette, IBM Sytems and Technology Group (United States)
Monica Barrett, IBM Sytems and Technology Group (United States)
Andrew Watts, IBM Sytems and Technology Group (United States)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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