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Proceedings Paper

Evaluating films for high transmission attenuated phase shift masks
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Paper Abstract

Three types of high transmission attenuated phase shift masks were evaluated. The attenuating materials were obtained from commercial and non-commercial sources. Various key performance metrics were investigated. Blanket film transmission and reflection was measured at various wavelengths. Laser durability and cleaning durability were measured. Standard dry etch processes were used for each film and the profile and surface properties were compared. Final mask transmission and phase were also measured. The summarized results show clear benefits of using some high transmission materials relative to others.

Paper Details

Date Published: 20 May 2006
PDF: 8 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628322 (20 May 2006); doi: 10.1117/12.681767
Show Author Affiliations
Satoru Nemoto, Toppan Electronics Inc. (United States)
Toru Komizo, Toppan Electronics Inc. (United States)
Yasutaka Kikuchi, Toppan Electronics Inc. (United States)
Emily Gallagher, IBM Microelectronics (United States)
Jason Benz, IBM Microelectronics (United States)
Michael Hibbs, IBM Microelectronics (United States)
Takashi Haraguchi, Toppan Printing Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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