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Proceedings Paper

Dissolution behavior of chemically amplified resist for advanced mask- and NIL mold-making as studied by dissolution rate monitor
Author(s): Kazumasa Takeshi; Kazuto Oono; Yoshiyuki Negishi; Daisuke Inokuchi; Keishi Tanaka; Akira Tamura
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Paper Abstract

The dissolution behaviors of chemically amplified resists for electron beam lithography (EB CARs) have been investigated using the technique of quartz crystal microbalance (QCM) method. We report the first direct measurement of the dissolution rate of EB CARs and the comparison with CAR of using KrF exposure in wafer fabrication. The EB CAR for nano-imprint lithography mold making was also evaluated by this technique, and then resolved 50 nm line and space patterns using conventional 50 KV variable shape beam writing system. The understanding of dissolution kinetics of EB CARs is capable of designing high performance resists in near future.

Paper Details

Date Published: 20 May 2006
PDF: 8 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831Z (20 May 2006); doi: 10.1117/12.681763
Show Author Affiliations
Kazumasa Takeshi, Toppan Printing Co., Ltd. (Japan)
Kazuto Oono, Toppan Printing Co., Ltd. (Japan)
Yoshiyuki Negishi, Toppan Printing Co., Ltd. (Japan)
Daisuke Inokuchi, Toppan Printing Co., Ltd. (Japan)
Keishi Tanaka, Toppan Printing Co., Ltd. (Japan)
Akira Tamura, Toppan Printing Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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