Share Email Print
cover

Proceedings Paper

Higher current density operation with EB reticle writer EBM-5000
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The performance of electron beam reticle writer EBM-5000(NFT) was examined with higher current density. The current density was raised up to 70A/cm2 against to its standard current density 50A/cm2, and sufficiently good results were obtained with that operating condition. We concluded that the performance with that operating condition was good enough to produce photomasks for 65nm node devices.

Paper Details

Date Published: 20 May 2006
PDF: 10 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62831L (20 May 2006); doi: 10.1117/12.681747
Show Author Affiliations
Masato Saito, Toshiba Corp. (Japan)
Kunihiro Ugajin, Toshiba Corp. (Japan)
Tomotaka Higaki, Toshiba Corp. (Japan)
Hideaki Nishino, Toshiba Corp. (Japan)
Hidehiro Watanabe, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

© SPIE. Terms of Use
Back to Top