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Proceedings Paper

Sulfate-free photomask cleaning technology
Author(s): Shingo Anzai; Noriaki Takagi; Tomoaki Kamiyama; Naotoshi Kawaguchi; Mikio Ishijima; Toshimitsu Watanabe; Hiroaki Morimoto; Tsuneaki Kuwajima; Makito Nakatsu; Shin-ichi Hasegawa
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Paper Abstract

To eliminate ammonium sulfate haze caused from sulfuric acid residue on the mask surface, we have been working for resist stripping and cleaning without the use of sulfuric acid process. This paper describes sulfate-free photomask cleaning technology by improving ozone cleaning process.

Paper Details

Date Published: 20 May 2006
PDF: 5 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62830B (20 May 2006); doi: 10.1117/12.681737
Show Author Affiliations
Shingo Anzai, Toppan Printing Co., Ltd. (Japan)
Noriaki Takagi, Toppan Printing Co., Ltd. (Japan)
Tomoaki Kamiyama, Toppan Printing Co., Ltd. (Japan)
Naotoshi Kawaguchi, Toppan Printing Co., Ltd. (Japan)
Mikio Ishijima, Toppan Printing Co., Ltd. (Japan)
Toshimitsu Watanabe, Toppan Printing Co., Ltd. (Japan)
Hiroaki Morimoto, Toppan Printing Co., Ltd. (Japan)
Tsuneaki Kuwajima, Tsukuba Semi Technology Co., Ltd. (Japan)
Makito Nakatsu, Tsukuba Semi Technology Co., Ltd. (Japan)
Shin-ichi Hasegawa, Tsukuba Semi Technology Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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