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Proceedings Paper

EBM-5000: electron-beam mask writer for 45-nm node
Author(s): Hitoshi Sunaoshi; Yuichi Tachikawa; Hitoshi Higurashi; Tomohiro Iijima; Junichi Suzuki; Takashi Kamikubo; Kenji Ohtoshi; Hirohito Anze; Takehiko Katsumata; Noriaki Nakayamada; Shigehiro Hara; Shuichi Tamamushi; Yoji Ogawa
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Paper Abstract

EBM-5000 equipped with the new feature of high current density (50A/cm2) has been developed for 45 nm technology node (half pitch (hp) 65 nm). EBM-5000 adopts 50 kV variable shaped electron beam (VSB)/vector scan architecture and continuous motion stage, following the steps of preceding EBM series. In addition to the high current density, new technologies such as high resolution electron optics, finer increment for beam position and exposure time control, and new data format "VSB-12" to handle large data volume have been introduced on EBM-5000. These new technologies address two conflicting issues: improvement of throughput and better accuracy. This paper will report the key challenging technologies, certain results of EBM-5000 operation and findings obtained through our development efforts that can be applied to future generation tools. The fundamental local CD uniformity (LCDU) limit is also discussed.

Paper Details

Date Published: 20 May 2006
PDF: 9 pages
Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 628306 (20 May 2006); doi: 10.1117/12.681732
Show Author Affiliations
Hitoshi Sunaoshi, NuFlare Technology Inc. (Japan)
Yuichi Tachikawa, NuFlare Technology Inc. (Japan)
Hitoshi Higurashi, NuFlare Technology Inc. (Japan)
Tomohiro Iijima, NuFlare Technology Inc. (Japan)
Junichi Suzuki, NuFlare Technology Inc. (Japan)
Takashi Kamikubo, NuFlare Technology Inc. (Japan)
Kenji Ohtoshi, NuFlare Technology Inc. (Japan)
Hirohito Anze, NuFlare Technology Inc. (Japan)
Takehiko Katsumata, NuFlare Technology Inc. (Japan)
Noriaki Nakayamada, NuFlare Technology Inc. (Japan)
Shigehiro Hara, NuFlare Technology Inc. (Japan)
Shuichi Tamamushi, NuFlare Technology Inc. (Japan)
Yoji Ogawa, NuFlare Technology Inc. (Japan)


Published in SPIE Proceedings Vol. 6283:
Photomask and Next-Generation Lithography Mask Technology XIII
Morihisa Hoga, Editor(s)

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