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Proceedings Paper

2D photonic crystal patterning for high-volume LED manufacturing
Author(s): Rob Hershey; Mike Miller; Chris Jones; Mahadevan Ganapathi Subramanian; Xiaoming Lu; Gary Doyle; David Lentz; Dwayne LaBrake
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Paper Abstract

Due to their small dimensions when used for visible light, the patterning of photonic crystals has only been possible with costly electron beam lithography and low throughput R&D and pilot production grade imprint lithography. This paper will focus on results from a high throughput imprint tool capable of processing over 20 wafers per hour on 50- 100mm sapphire, GaAs, SiC, Ge and metal substrates. An overview of the process used as well as the results of patterning photonic crystal patterns on sapphire wafers and etching them into a SiO2 hard mask will be presented. Finally an analysis of the cost of ownership which currently stands at ~ $20/wf (<$0.01/mm2 for 50mm wafers) will be presented and opportunities for improvement discussed.

Paper Details

Date Published: 12 September 2006
PDF: 10 pages
Proc. SPIE 6337, Sixth International Conference on Solid State Lighting, 63370M (12 September 2006); doi: 10.1117/12.681481
Show Author Affiliations
Rob Hershey, Molecular Imprints Inc. (United States)
Mike Miller, Molecular Imprints Inc. (United States)
Chris Jones, Molecular Imprints Inc. (United States)
Mahadevan Ganapathi Subramanian, Molecular Imprints Inc. (United States)
Xiaoming Lu, Molecular Imprints Inc. (United States)
Gary Doyle, Molecular Imprints Inc. (United States)
David Lentz, Molecular Imprints Inc. (United States)
Dwayne LaBrake, Molecular Imprints Inc. (United States)

Published in SPIE Proceedings Vol. 6337:
Sixth International Conference on Solid State Lighting
Ian T. Ferguson; Nadarajah Narendran; Tsunemasa Taguchi; Ian E. Ashdown, Editor(s)

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