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Proceedings Paper

Dynamic shadow mask technique for device fabrication in UHV
Author(s): Stefan Egger
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Paper Abstract

Clean structures are fabricated in ultrahigh vacuum conditions by evaporation through a shadow mask, avoiding contamination by resist, chemicals or exposure to air. Moving the shadow mask with nanometer precision during the growth of the structures gives additional freedom in determining the lateral shape and the thickness profile. Different materials can easily be combined and chosen from a large range of metals, semiconductors or insulators. In-situ treated surfaces or, conversely, ex-situ pre-fabricated samples can be used as substrates.

Paper Details

Date Published: 8 September 2006
PDF: 6 pages
Proc. SPIE 6340, Solar Hydrogen and Nanotechnology, 63400Z (8 September 2006); doi: 10.1117/12.681375
Show Author Affiliations
Stefan Egger, National Institute for Materials Science (Japan)


Published in SPIE Proceedings Vol. 6340:
Solar Hydrogen and Nanotechnology
Lionel Vayssieres, Editor(s)

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