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Proceedings Paper

Characterisation of optical thin films obtained by plasma ion assisted deposition
Author(s): Frank Placido; Des Gibson; Ewan Waddell; Edward Crossan
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Paper Abstract

Optical thin films deposited using plasma ion assisted deposition (PAD) are characterized by ellipsometry, spectrophotometry and nano-indentation. PAD utilizes a dc voltage between an anode and a hot cathode, creating a high-density plasma that is extracted by an electromagnetic field. The assisted source allows denser, more stable films with higher refractive indices to be deposited without additional heating of the substrates. The primary advantage of the plasma compared to the ion source approach is that the plasma fills the vacuum chamber and couples into the evaporant, inducing partial ionization.

Paper Details

Date Published: 28 August 2006
PDF: 6 pages
Proc. SPIE 6286, Advances in Thin-Film Coatings for Optical Applications III, 628602 (28 August 2006); doi: 10.1117/12.681027
Show Author Affiliations
Frank Placido, Univ. of Paisley (United Kingdom)
Des Gibson, Univ. of Paisley (United Kingdom)
Ewan Waddell, Thin Film Solutions Ltd. (United Kingdom)
Edward Crossan, Univ. of Paisley (United Kingdom)

Published in SPIE Proceedings Vol. 6286:
Advances in Thin-Film Coatings for Optical Applications III
Michael J. Ellison, Editor(s)

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