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Proceedings Paper

Dual ion-beam sputter deposited Mo/Si multilayers with sub-nanometer barrier layers
Author(s): Stefan Braun; Peter Gawlitza; Sebastian Lipfert; Stefan Schaedlich; Andreas Leson
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Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 63170H; doi: 10.1117/12.680586
Show Author Affiliations
Stefan Braun, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Peter Gawlitza, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Sebastian Lipfert, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Stefan Schaedlich, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)
Andreas Leson, Fraunhofer-Institut für Werkstoff- und Strahltechnik (Germany)


Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

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