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Proceedings Paper

Topological alignment of NLCs using nanoscale metallic grooves
Author(s): R. Ghannam; N. Collings; W. Crossland; T. Wilkinson
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Paper Abstract

Liquid crystal on silicon (LCoS) devices have been exploiting the ever-diminishing CMOS silicon process, which is pushing towards 45nm dimensions. Consequently, such fine metallic structures are bound to influence the alignment of the liquid crystal material. To illustrate this, a number of 1D metal patterns with differing mark-to-space ratio were fabricated using an Electron-Beam exposure technique. The results confirmed Dwight Berreman's topological alignment theory regarding the pitch of the surface topography and how this influences the quality of the planar alignment. Patterns with a metal to spacing ratio of 1:1 were shown to yield higher contrast ratios and hence better planar alignment. Such findings could be useful for developing non-intrusive alignment methods for nanoscale LCoS devices.

Paper Details

Date Published: 15 September 2006
PDF: 8 pages
Proc. SPIE 6332, Liquid Crystals X, 63320H (15 September 2006); doi: 10.1117/12.680299
Show Author Affiliations
R. Ghannam, Univ. of Cambridge (United Kingdom)
N. Collings, Univ. of Cambridge (United Kingdom)
W. Crossland, Univ. of Cambridge (United Kingdom)
T. Wilkinson, Univ. of Cambridge (United Kingdom)

Published in SPIE Proceedings Vol. 6332:
Liquid Crystals X
Iam-Choon Khoo, Editor(s)

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