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Proceedings Paper

Compact x-ray microscopes for EUV- and soft x-radiation with spectral imaging capabilities
Author(s): David Schäfer; Thomas Nisius; Rolf Früke; Stefan Rausch; Marek Wieland; Uli Vogt; Thomas Wilhein
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Paper Abstract

We report on a compact full-field transmission microscope (CTXM) and a scanning transmission microscope (CSTXM) developed for imaging at laboratory scale X-ray sources. The microscopes are based on zone plates for imaging in the EUV and water window region (wavelength 2.3 nm to 4.4 nm). The radiation for the full-field microscope is generated by focusing short laser pulses with an energy of 100 mJ on a 20 μm cryogenic liquid nitrogen jet. A condenser zone plate in conjunction with an aperture is used to provide monochromatic sample illumination. This allows for easy wavelength selection within the N2-Emission spectrum. Thus, the presented setup offers the possibility of spectral imaging. A micro zone plate generates a magnified image detected by a back illuminated TE-cooled CCD camera (1,340 x 1,300 pixel). The actual configuration provides magnifications up to 1,000x at exposure times in a range of a few ten minutes with sub-100 nm resolution. Our compact scanning microscope (CSTXM) operates with a zone plate, focusing the radiation onto a sample which is placed on a piezo driven xy-stage with 1 nm lateral resolution. Using high-harmonic radiation at 13 nm wavelength sub-micron resolution is achieved. With light at 17 nm wavelength originating from the O-VI emission line of a laser plasma source based on an ethanol jet, 500 nm structures were imaged in less than 20 minutes resulting in an 100 x 40 pixel image.

Paper Details

Date Published: 29 August 2006
PDF: 9 pages
Proc. SPIE 6317, Advances in X-Ray/EUV Optics, Components, and Applications, 631704 (29 August 2006); doi: 10.1117/12.679819
Show Author Affiliations
David Schäfer, Univ. of Applied Sciences Koblenz (Germany)
Thomas Nisius, Univ. of Applied Sciences Koblenz (Germany)
Rolf Früke, Univ. of Applied Sciences Koblenz (Germany)
Stefan Rausch, Univ. of Applied Sciences Koblenz (Germany)
Marek Wieland, Univ. Hamburg (Germany)
Uli Vogt, KTH Stockholm (Sweden)
Thomas Wilhein, Univ. of Applied Sciences Koblenz (Germany)

Published in SPIE Proceedings Vol. 6317:
Advances in X-Ray/EUV Optics, Components, and Applications
Ali M. Khounsary; Christian Morawe, Editor(s)

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